Si reacts with ${CH}_{3} Cl$ at 573 K in the presence of Cu powder to form methyl substituted chlorosilanes. Among the given methyl substituted chlorosilanes. Whose yield is minimum?

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${CH}_{3} {SiCl}_{3}$

${({CH}_{3})}_{2} {SiCl}_{2}$

${({CH}_{3})}_{3} SiCl$

${({CH}_{3})}_{4} Si$

answer is D.

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Detailed Solution

Correct Answer: Option (A)

(CH₃)₄Si (tetramethylsilane) minimum yield.

In the Rochow (direct) process (Si + CH₃Cl, Cu, 573 K) methyl groups add to silicon stepwise. Each successive substitution becomes harder because fewer reactive Si–Cl sites remain and steric crowding around Si increases. Statistically and mechanistically the pathway strongly favors formation of partially chlorinated products especially (CH₃)₂SiCl₂ rather than the fully methylated product.

Forming (CH₃)₄Si requires four methylations and is both least probable and sterically/electronically the least favorable, so it appears only in trace amounts. Hence (CH₃)₄Si has the smallest yield among the choices.

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